Surface Chemistry

Our firm, Surface Chemistry, offers a wide spectrum of options to modify the chemical and physical properties of surfaces. Here, Dr. Grünwald’s more than thirty years of experience provide a wealth of possibilities, particularly in the areas of plasma and thin film techniques (CVD, PVD, etching and surface modification processes), including:

Plasma-chemical reactions in the gas phase

  • Discover desired reaction pathways
  • Generate aggressive gas species for etching purposes
  • Find and correctly prepare the right gas molecules for coating or pattern etching
  • Recognize problematic reaction channels
  • Avoid undesirable or even dangerous exhaust emissions

Plasma reactions on plastics, metals, and glass

Deposition of metal coatings

Apply highly stable and thick, non-metallic coats using plasma polymerization

Wet application or vapor deposition of polymer coatings

  • Adhesion-resistant coatings
  • Friction-reducing coatings
  • Easy-care coatings (= combination of the two preceding features) in production

Plasma reactors for gentle production of coatings with defined chemistry

Plasma reactors with high deposition rates

We can assist you in the following areas:

  • Consulting, trouble shooting, process optimization
  • Safety analyses
  • Plant/equipment optimization
  • Enhancement of processes
  • Training and continuing education
  • Literature searches, expert opinions
  • Support and assistance with patents