Plasma

Today, low-temperature plasma (usually used in a vacuum) is well established as a reaction medium for “impossible” chemical reactions. The breakthrough here was made in connection with plasma-assisted patterning of layers on computer chips in the 1980s and 1990s. Without plasma, that structuring would not have been economically feasible. As a result, more and more plasma processes have been introduced in a range of industries.

Dr. Grünwald’s first contact with plasma came during his student days and since then, more than 30 years later, he has continued to advance this fascinating technology through research and application in a whole range of fields. His contributions to the field include innumerable lectures, scientific articles, and patents, as well as book chapters (see bibliography).)

Although plasma technology is well established in many fields, its potential is far from exhausted, and high on that list of possibilities is the development of simpler plasma devices.

In particular, low-temperature plasmas at atmospheric pressure that have been heavily researched recently have opened up new possibilities for integrating plasmas in ongoing production. While until recently parts normally had to be surrounded by a vacuum chamber in order to use low-pressure plasmas, it is now possible to treat parts on an “ambulant” basis, that is, while moving. In the case of more challenging chemical processes, however, special care must be taken in managing the reaction gases and disposing of gas emissions.

Surface Chemistry aims to find the most advantageous solution for you, whether the choice is low-pressure or atmospheric pressure applications.

Working with a small, highly experienced company specializing in this field, we can also take care of maintaining or building plasma devices and plants.